ASTM-E684 2000

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E684-95(2000) Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces

Published By	Publication Date	Number of Pages
ASTM	2000	2

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Categories: 17.220.20 - Measurement of electrical and magnetic quantities, ASTM

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Description

ASTM E684-95-Reapproved2000

Historical Standard: Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces

ASTM E684

Scope

1.1 This practice describes a simple and approximate method for determining the shape and current density of ion beams. The practice is limited to ion beams of diameter greater than 0.5 mm of the type used for sputtering of solid surfaces to obtain sputter depth profiles. It is assumed that the ion-beam current density is symmetrical about the beam axis.

1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Keywords

ion beam sputtering

ICS Code

ICS Number Code 17.220.20 (Measurement of electrical and magnetic quantities)

DOI: 10.1520/E0684-95R00

Additional information

Standard Title	E684-95(2000) Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces
Published Code	ASTM
Publication Date	2000
Pages Count	2
ICS Codes	17.220.20 - Measurement of electrical and magnetic quantities