ISO 14706:2014

$36.40

Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

Published By	Publication Date	Number of Pages
ISO	2014-08	32

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Categories: 71.040.40 - Chemical analysis, ISO

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Description

ISO 14706:2014 specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces. The method is applicable to the following: elements of atomic number from 16 (S) to 92 (U); contamination elements with atomic surface densities from 1 × 1010 atoms/cm2 to 1 × 1014 atoms/cm2; contamination elements with atomic surface densities from 5 × 108 atoms/cm2 to 5 × 1012 atoms/cm2 using a VPD (vapour-phase decomposition) specimen preparation method.

Additional information

Published Code	ISO
Published By	International Organization for Standardization
Publication Date	2014-08
Pages Count	32
Language	English
Edition	2
File Size	870.4 KB
ICS Codes	71.040.40 - Chemical analysis

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ISO 14706:2014

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