BS ISO 23812:2009

$142.49

Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials

Published By	Publication Date	Number of Pages
BSI	2009	30

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Categories: 71.040.40 - Chemical analysis, BSI

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Description

1.1

This International Standard specifies a procedure for calibrating the depth scale in a shallow region, less than 50 nm deep, in SIMS depth profiling of silicon, using multiple delta-layer reference materials.

1.2 This International Standard is not applicable to the surface-transient region where the sputtering rate is not in the steady state.

1.3 This International Standard is applicable to single-crystalline silicon, polycrystalline silicon and amorphous silicon.

Additional information

Status	Confirmed
Pages	30
Publication Date	2009-05-31
ISBN	978 0 580 55765 1
Standard Number	BS ISO 23812:2009
Title	Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials
Identical National Standard Of	ISO 23812:2009
Descriptors	Depth measurement, Mass spectrometry, Calibration, Surface chemistry, Secondary, Chemical analysis and testing, Spectroscopy, Depth, Ions, Silicon, Surfaces
Publisher	BSI
Committee	CII/60
ICS Codes	71.040.40 - Chemical analysis

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BS ISO 23812:2009

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